US Patent Issued to BEIJING NAURA MICROELECTRONICS EQUIPMENT on Sept. 29 for "Semiconductor reaction chamber" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,749,651, issued on Sept. 29, was assigned to BEIJING NAURA MICROELECTRONICS EQUIPMENT Co. LTD. (Beijing).

"Semiconductor reaction chamber" was invented by Xingfei Mao (Beijing), Gang Wei (Beijing), Wei Wang (Beijing) and Guodong Chen (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor reaction chamber includes a chamber body, a dielectric window, a gas inlet member, a carrier, an upper radio frequency assembly, and a plurality of ultraviolet light generation devices. The dielectric window is arranged at a top of the chamber body. The gas inlet member is arranged at a center position of the dielectric window and configured to introdu...