US Patent Issued to BEIJING NAURA MICROELECTRONICS EQUIPMENT on Sept. 29 for "Semiconductor processing equipment and impedance-matching method" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,749,654, issued on Sept. 29, was assigned to BEIJING NAURA MICROELECTRONICS EQUIPMENT Co. LTD. (Beijing).

"Semiconductor processing equipment and impedance-matching method" was invented by Wenqing Li (Beijing), Gang Wei (Beijing), Jing Yang (Beijing), Shuqi Jiang (Beijing) and Di Zhang (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "An impedance-matching method applied to semiconductor processing equipment includes a processing preparation step and a processing ignition step. The processing preparation step includes obtaining currently stored impedance-matching data corresponding to a processing ignition step. The impedance-matching data includ...