US Patent Issued to Beijing E-Town Semiconductor Technology, Mattson Technology on Feb. 24 for "Variable mode plasma chamber utilizing tunable plasma potential" (California Inventors)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,562,342, issued on Feb. 24, was assigned to Beijing E-Town Semiconductor Technology Co. Ltd. (Beijing) and Mattson Technology Inc. (Fremont, Calif.).

"Variable mode plasma chamber utilizing tunable plasma potential" was invented by Stephen E. Savas (Pleasanton, Calif.) and Shawming Ma (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Plasma processing apparatus and associated methods are provided. In one example, a plasma processing apparatus can include a plasma chamber configured to be able to hold a plasma. The plasma processing apparatus can include a dielectric window forming at least a portion of a wall of the plasma chamber. The p...