US Patent Issued to Avantium Knowledge Centre on July 28 for "Method for the preparation of a gas diffusion layer and a gas diffusion layer obtained or obtainable by such method" (Dutch Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,692,607, issued on July 28, was assigned to Avantium Knowledge Centre B.V. (Amsterdam).

"Method for the preparation of a gas diffusion layer and a gas diffusion layer obtained or obtainable by such method" was invented by Matthew Francis Philips (Amsterdam), Davide Ansovini (Amsterdam) and Marta Catarina Costa Figueiredo (Amsterdam).

According to the abstract* released by the U.S. Patent & Trademark Office: "Method for the preparation of a gas diffusion layer, containing the steps of: a) preparing a carrier-binder paste comprising a solvent, a fluorinated binder and conductive carrier articles; b) preparing an adhesive composition comprising a solvent, a fluorinated binder and essent...