ALEXANDRIA, Va., March 24 -- United States Patent no. 12,588,288, issued on March 24, was assigned to AUO Corp. (Hsinchu, Taiwan).

"Active device substrate" was invented by Chia-Yang Lu (Hsinchu, Taiwan) and Pei-Yun Wang (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An active device substrate including a substrate, a transfer wire, a first insulating layer, a second insulating layer, a first semiconductor pattern, a second semiconductor pattern, a first connection structure, a second connection structure, a first gate, a second gate, a third insulating layer, a first source/drain, and a second source/drain is provided. The first insulating layer is located above the transfer wire. The secon...