US Patent Issued to AUO on July 14 for "Active device substrate" (Taiwanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,357, issued on July 14, was assigned to AUO Corp. (Hsinchu, Taiwan).

"Active device substrate" was invented by Chi-Sheng Liao (Hsinchu, Taiwan), Ken Wei Chang (Hsinchu, Taiwan), Bo-Ru Jian (Hsinchu, Taiwan), Bin Cheng Lin (Hsinchu, Taiwan) and Ta-Wen Liao (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An active device substrate includes an active device and an electrode. The electrode includes a first light shielding conductive pattern, a second light shielding conductive pattern, a third light shielding conductive pattern, and a first metal oxide protection pattern. The first light shielding conductive pattern, the second light shi...