ALEXANDRIA, Va., June 9 -- United States Patent no. 12,652,750, issued on June 9, was assigned to Astera Labs Inc. (Santa Clara, Calif.).

"Interlocking structure for crosstalk reduction and method of manufacture" was invented by Abhinaya Easwari Mohan (San Jose, Calif.), Zengji Zhao (Sunnyvale, Calif.) and Yiqi Tang (Allen, Texas).

According to the abstract* released by the U.S. Patent & Trademark Office: "An electronic system having a mounting substrate with a plurality of layers. The mounting substrate combines an upper shield structure and a lower shield structure to form an interlocking shielding structure to reduces crosstalk interference and improve return loss and insertion loss for high-speed serial communication circuits. The upp...