US Patent Issued to ASML Netherlands on Sept. 22 for "Prolonging optical element lifetime in an EUV lithography system" (Dutch, Belgian, American Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,021, issued on Sept. 22, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Prolonging optical element lifetime in an EUV lithography system" was invented by Yue Ma (Escondido, Calif.), Antonius Theodorus Wilhelmus Kempen (Rosmalen, Netherlands), Klaus Martin Hummler (San Diego), Johannes Hubertus Josephina Moors (Helmond, Netherlands), Jeroen Hubert Rommers (Lommel, Belgium), Hubertus Johannes Van De Wiel (Oss, Netherlands), Andrew David Laforge (Poway, Calif.), Fernando Brizuela (San Diego), Rob Carlo Wieggers (Utrecht, Netherlands), Umesh Prasad Gomes (Eindhoven, Netherlands), Elena Nedanovska (Eindhoven, Netherlands), Celal Korkmaz (Eindhoven, Netherlands), Alex...