US Patent Issued to ASML Netherlands on Sept. 22 for "Method of spatially aligning a patterning device and a substrate" (Dutch Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,035, issued on Sept. 22, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Method of spatially aligning a patterning device and a substrate" was invented by Hans Butler (Best, Netherlands), Marinus Petrus Reijnders (Eindhoven, Netherlands) and Patricius Aloysius Jacobus Tinnemans (Hapert, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of spatially aligning a patterning device and a substrate, wherein the patterning device and the substrate are separated by an optical path comprising one or more moveable optical components is described, the method comprising: -performing a plurality of alignment measurements, wher...