ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,354, issued on Sept. 1, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Method for inferring a local uniformity metric" was invented by Simon Gijsbert Josephus Mathijssen (Rosmalen, Netherlands) and Kaustuve Bhattacharyya (Veldhoven, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of inferring a value for at least one local uniformity metric relating to a product structure, the method including: obtaining intensity data including an intensity image relating to at least one diffraction order obtained from a measurement on a target; obtaining at least one intensity distribution from the intensity image; determining...