US Patent Issued to ASML NETHERLANDS on Oct. 6 for "Intensity measurements using off-axis illumination" (Connecticut Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,488, issued on Oct. 6, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Intensity measurements using off-axis illumination" was invented by Mohamed Swillam (Wilton, Conn.), Stephen Roux (New Fairfield, Conn.), Justin Lloyd Kreuzer (Trumbull, Conn.) and Roxana Rezvani Naraghi (Easton, Conn.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems, apparatuses, and methods are provided for measuring intensity using off-axis illumination. An example method can include illuminating a region of a surface of a substrate with a first radiation beam at a first incident angle and, in response, measuring a first set of photons diffracted from the...