US Patent Issued to ASML Netherlands on Oct. 27 for "Metrology method" (Dutch Inventor)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,218, issued on Oct. 27, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Metrology method" was invented by Elie Badr (Veldhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A metrology method comprising: performing a first exposure on a substrate to form a first patterned layer including a plurality of first target units, each first target unit comprising a first target feature; performing a second exposure on the substrate to form a second patterned layer comprising second target units overlying respective ones of the first target units, each of the second target units having a second target feature, wherein ones of t...