US Patent Issued to ASML Netherlands on Oct. 27 for "Method of generating a sample map, computer program product, charged particle inspection system, method of processing a sample, assessment method" (California Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,776,470, issued on Oct. 27, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Method of generating a sample map, computer program product, charged particle inspection system, method of processing a sample, assessment method" was invented by Tzu-Chao Chen (Dublin, Calif.) and Te-Sheng Wang (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods are disclosed for generating a sample map and processing a sample. In one arrangement, a method comprises measuring a position of a first mark in each of a plurality of field regions on sample. A first model is fitted to the measured positions of the first marks. The fitted first mo...