US Patent Issued to ASML Netherlands on Nov. 3 for "Charged particle device, charged particle assessment apparatus, measuring method, and monitoring method" (Dutch Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,785,035, issued on Nov. 3, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Charged particle device, charged particle assessment apparatus, measuring method, and monitoring method" was invented by Yan Ren (Eindhoven, Netherlands), Marijke Scotuzzi (Eindhoven, Netherlands), Albertus Victor Gerardus Mangnus (Eindhoven, Netherlands) and Erwin Paul Smakman (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a charged particle device for a charged particle inspection apparatus for projecting an array of sub-beams towards a sample, the charged particle device comprising: a charged particle optical element an...