US Patent Issued to ASML Netherlands on May 5 for "Beam manipulator in charged particle-beam exposure apparatus" (Dutch Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,620,547, issued on May 5, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Beam manipulator in charged particle-beam exposure apparatus" was invented by Johannes Cornelis Jacobus De Langen (Delft, Netherlands), Dmitry Mudretsov (Delft, Netherlands) and Dongbin Cai (The Hague, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "An improved electron beam manipulator for manipulating an electron beam in an electron projection system and a method for manufacturing thereof are disclosed. The electron beam manipulator comprises a body having a first surface and a second surface opposing to the first surface and an interconnecting surface ...