ALEXANDRIA, Va., May 26 -- United States Patent no. 12,639,832, issued on May 26, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Simulation-assisted metrology image alignment" was invented by Te-Sheng Wang (San Jose, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for aligning a measured image of a pattern printed on a substrate with a design layout. The method includes: obtaining a design layout of a pattern to be printed on a substrate and a measured image of the pattern printed on the substrate; performing a simulation process to generate a plurality of simulated contours of the design layout for a plurality of process conditions of a patterning process; identifying a set ...