US Patent Issued to ASML NETHERLANDS on May 19 for "Method of reducing cyclic error effects in a lithographic process, projection system and lithographic apparatus comprising a projection system" (Dutch Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,631,976, issued on May 19, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Method of reducing cyclic error effects in a lithographic process, projection system and lithographic apparatus comprising a projection system" was invented by Hans Butler (Best, Netherlands) and Robertus Johannes Marinus De Jongh (Boxmeer, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of reducing cyclic error effects in a lithographic process having a projection phase and an idle phase, the method including controlling in a first control loop a first position of a first module, the first module being a position controlled mirror of a project...