ALEXANDRIA, Va., May 19 -- United States Patent no. 12,631,519, issued on May 19, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Measurement system and method of use" was invented by Achim Woessner (Eindhoven, Netherlands), Roberto Pagano (Breda, Netherlands) and Mark-Jan Spijkman (Eindhoven, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "A measurement system (11), the measurement system comprising: a sensor apparatus (22); an illumination system (IL1) arranged to illuminate the sensor apparatus with radiation, the sensor apparatus comprising a patterned region arranged to receive a radiation beam and to form a plurality of diffraction beams, the diffraction beams being separate...