US Patent Issued to ASML Netherlands on May 19 for "Assembly for separating radiation in the far field" (Dutch Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,631,974, issued on May 19, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Assembly for separating radiation in the far field" was invented by Petrus Wilhelmus Smorenburg (Veldhoven, Netherlands), Johan Reinink (Uden, Netherlands), Marinus Petrus Reijnders (Eindhoven, Netherlands), Han-Kwang Nienhuys (Utrecht, Netherlands), David O'Dwyer (Eindhoven, Netherlands), Sander Bas Roobol (Veldhoven, Netherlands), Christina Lynn Porter (Veldhoven, Netherlands) and Stephen Edward (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "An assembly and method for separating first radiation and second radiation in the far field, where...