US Patent Issued to ASML Netherlands on March 31 for "Sensor positioning method, a positioning system, a lithographic apparatus, a metrology apparatus, and a device manufacturing method" (Dutch Inventors)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,591,183, issued on March 31, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Sensor positioning method, a positioning system, a lithographic apparatus, a metrology apparatus, and a device manufacturing method" was invented by Jeroen Johan Maarten Van De Wijdeven (Eindhoven, Netherlands), Michael Johannes Christiaan Ronde (Berghem, Netherlands), Bram Antonius Gerardus Lomans (Eindhoven, Netherlands) and Bastiaan Lambertus Wilhelmus Marinus Van De Ven (Rosmalen, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention provides a method for positioning a sensor over a target on a moveable object, comprising the following s...