US Patent Issued to ASML NETHERLANDS on March 31 for "Method for obtaining training data for training a model of a semiconductor manufacturing process" (Dutch Inventors)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,591,177, issued on March 31, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Method for obtaining training data for training a model of a semiconductor manufacturing process" was invented by Roy Werkman (Eindhoven, Netherlands) and Lydia Marianna Vergaij-Huizer (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for obtaining a training data set including synthetic metrology data, the training data set being configured for training of a model relating to a manufacturing process for manufacturing an integrated circuit. The method includes obtaining behavioral property data describing a behavior of a process p...