US Patent Issued to ASML Netherlands on March 31 for "Enhanced alignment for a photolithographic apparatus" (Dutch Inventors)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,591,184, issued on March 31, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Enhanced alignment for a photolithographic apparatus" was invented by Sebastianus Adrianus Goorden (Eindhoven, Netherlands) and Simon Reinald Huisman (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is an apparatus for and method of using local alignment position deviation parameters for alignment marks on a semiconductor wafer wherein the parameters are used to generate one or more values indicating a condition of the alignment marks, which values may be used to obtain an wafer grid model having an improved fit."

The patent wa...