US Patent Issued to ASML NETHERLANDS on March 3 for "Method for determining a mask pattern comprising optical proximity corrections using a trained machine learning model" (California Inventors)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,566,368, issued on March 3, was assigned to ASML NETHERLANDS (Veldhoven, Netherlands).

"Method for determining a mask pattern comprising optical proximity corrections using a trained machine learning model" was invented by Yu Cao (Saratoga, Calif.), Jun Tao (Cupertino, Calif.), Quan Zhang (San Jose, Calif.), Yongsheng Shu (San Jose, Calif.) and Wei-chun Fong (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for determining a mask pattern and a method for training a machine learning model. The method for determining a mask pattern includes obtaining, via executing a model using a target pattern to be printed on a substrate as an ...