US Patent Issued to ASML NETHERLANDS on March 3 for "Apparatus and method for determining three dimensional data based on an image of a patterned substrate" (Dutch, American Inventors)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,567,164, issued on March 3, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Apparatus and method for determining three dimensional data based on an image of a patterned substrate" was invented by Tim Houben (Veldhoven, Netherlands), Thomas Jarik Huisman (Eindhoven, Netherlands), Maxim Pisarenco (Son en Breugel, Netherlands), Scott Anderson Middlebrooks (Duizel, Netherlands), Chrysostomos Batistakis (Eindhoven, Netherlands) and Yu Cao (Saratoga, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system, method, and apparatus for determining three-dimensional (3D) information of a structure of a patterned substrate. The 3D informatio...