US Patent Issued to ASML Netherlands on March 24 for "Image enhancement based on charge accumulation reduction in charged-particle beam inspection" (Oregon Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,586,753, issued on March 24, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Image enhancement based on charge accumulation reduction in charged-particle beam inspection" was invented by Xiang Wang (Portland, Ore.), Steffen Meyer (Portland, Ore.) and Mark O'Mahony (Portland, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An improved method and apparatus for enhancing an inspection image in a charged-particle beam inspection system. An improved method for enhancing an inspection image comprises acquiring a plurality of test images of a sample that are obtained at different landing energies, determining distortion levels for the plu...