US Patent Issued to ASML NETHERLANDS on March 17 for "Sub-field control of a lithographic process and associated apparatus" (Dutch, Japanese, Singaporean Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,578,655, issued on March 17, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Sub-field control of a lithographic process and associated apparatus" was invented by Rowin Meijerink (Valkenswaard, Netherlands), Putra Saputra (Singapore), Pieter Gerardus Jacobus Smorenberg (Rotterdam, Netherlands), Theo Wilhelmus Maria Thijssen (Eindhoven, Netherlands), Khalid Elbattay (Eindhoven, Netherlands), Ma Su Su Hlaing (Eindhoven, Netherlands), Paul Derwin (Eindhoven, Netherlands), Bo Zhong (Mie, Japan) and Masaya Komatsu (Kamakura, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for controlling a lithographic apparatus configured to ...