US Patent Issued to ASML NETHERLANDS on March 17 for "Method for determining a sampling scheme, a semiconductor substrate measurement apparatus, a lithographic apparatus" (Dutch, Singaporean Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,578,653, issued on March 17, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Method for determining a sampling scheme, a semiconductor substrate measurement apparatus, a lithographic apparatus" was invented by Pieter Gerardus Jacobus Smorenberg (Rotterdam, Netherlands), Putra Saputra (Singapore), Khalid Elbattay (Eindhoven, Netherlands), Paul Derwin (Eindhoven, Netherlands), Roy Werkman (Eindhoven, Netherlands), Erik Jensen (Veldhoven, Netherlands), Hyunwoo Yu (Veldhoven, Netherlands) and Gautam Sarma (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for determining a sampling scheme, the method including:...