US Patent Issued to ASML Netherlands on June 30 for "Apparatus and methods to generate deblurring model and deblur image" (California Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,670,561, issued on June 30, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Apparatus and methods to generate deblurring model and deblur image" was invented by Hairong Lei (San Jose, Calif.) and Wei Fang (Milpitas, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Described herein is a method, and system for training a deblurring model and deblurring an image (e.g., SEM image) of a patterned substrate using the deblurring model and depth data associated with multiple layers of the patterned substrate. The method includes obtaining, via a simulator using a target pattern as input, a simulated image of the substrate, the target patte...