US Patent Issued to ASML NETHERLANDS on June 16 for "Optimization of scanner throughput and imaging quality for a patterning process" (California Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,691, issued on June 16, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Optimization of scanner throughput and imaging quality for a patterning process" was invented by Xingyue Peng (San Jose, Calif.) and Duan-Fu Stephen Hsu (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for source mask optimization to increase scanner throughput for a patterning process is described. The method includes computing a multi-variable cost function of design variables that are representative of characteristics of the patterning process. The design variables may include (a) an illumination variable that is characteristic of an i...