US Patent Issued to ASML Netherlands on June 16 for "Lithographic apparatus, illumination system, and connection sealing device with protective shield" (California Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,694, issued on June 16, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Lithographic apparatus, illumination system, and connection sealing device with protective shield" was invented by Armin Bernhard Ridinger (San Diego) and Muchen Xu (San Diego).

According to the abstract* released by the U.S. Patent & Trademark Office: "A lithographic apparatus includes an illumination system to illuminate a pattern of a patterning device and a projection system to project an image of the pattern onto a substrate. The illumination system includes a first and second enclosures, a scaling device, and a protective device. The first enclosure encloses a first environment and incl...