US Patent Issued to ASML NETHERLANDS on July 28 for "Pellicle membrane for a lithographic apparatus" (Dutch Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,693,592, issued on July 28, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Pellicle membrane for a lithographic apparatus" was invented by Andrey Nikipelov (Eindhoven, Netherlands), Sander Baltussen (Castenray, Netherlands), Vadim Yevgenyevich Banine (Deurne, Netherlands), Alexandr Dolgov (Waalre, Netherlands), Inci Donmez Noyan (Eindhoven, Netherlands), Zomer Silvester Houweling (Utrecht, Netherlands), Arnoud Willem Notenboom (Rosmalen, Netherlands), Marcus Adrianus Van De Kerkhof (Helmond, Netherlands), Ties Wouter Van Der Woord (Helmond, Netherlands), Paul Alexander Vermeulen (Eindhoven, Netherlands), David Ferdinand Vles (Eindhoven, Netherlands), Victoria Voronin...