ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,393, issued on July 14, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).
"System and method for conditioning optical apparatuses" was invented by Oleg Viacheslavovich Voznyi (Eindhoven, Netherlands) and Bearrach Moest (Eindhoven, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a stage system, which comprises a pre-exposure element, and to a method employing the pre-exposure element for conditioning an optical system. The pre-exposure element comprises a radiation receiving area at a surface of the stage system, wherein the radiation receiving area comprises at least one pre-exposure plate configured to receive ...