US Patent Issued to ASML NETHERLANDS on Feb. 24 for "Inspection tool, method and lithographic apparatus" (Dutch Inventor)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,560,869, issued on Feb. 24, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Inspection tool, method and lithographic apparatus" was invented by Shikhar Bhardwaj (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A tool for assessing a hole property of one or more holes in a component of a lithographic apparatus, the tool including: an assessment substrate; a fluid supply configured to supply a jet of fluid from each of the one or more holes to a first surface of the assessment substrate, wherein the fluid is supplied at a fluid temperature such that the one or more jets of fluid cause local temperature variations in ...