US Patent Issued to ASML Netherlands on Feb. 17 for "Charged particle system, aperture array, charged particle tool and method of operating a charged particle system" (Dutch, American Inventors)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,555,740, issued on Feb. 17, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Charged particle system, aperture array, charged particle tool and method of operating a charged particle system" was invented by Diego Martinez Negrete Gasque (Delft, Netherlands), Vincent Claude Beugin (Nootdorp, Netherlands) and Weihua Yin (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A charged particle system generates a charged particle multi beam along a multi beam path. The charged particle system comprises an aperture array, a beam limit array and a condenser lens. In the aperture array are an array of apertures to generate from an up-...