US Patent Issued to ASML Netherlands on Aug. 4 for "Objective lens array assembly, electron-optical system, electron-optical system array, method of focusing" (Dutch Inventor)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,700,566, issued on Aug. 4, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Objective lens array assembly, electron-optical system, electron-optical system array, method of focusing" was invented by Marco Jan-Jaco Wieland (Delft, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Objective lens array assemblies and associated methods are disclosed. In one arrangement, the objective lens array assembly focuses a multi-beam of sub-beams on a sample. Planar elements define a plurality of apertures aligned along sub-beam paths. An objective lens array projects the multi-beam towards a sample. Apertures of one or more of the planar ele...