ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,699,326, issued on Aug. 4, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Mapping metrics between manufacturing systems" was invented by Siebe Tjerk De Zwart (Valkenswaard, Netherlands), Remco Dirks (Deurne, Netherlands), Gaurav Nanda (Eindhoven, Netherlands) and Bastiaan Onne Fagginger Auer (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and systems for determining a mapped intensity metric are described. Determining the mapped intensity metric includes determining an intensity metric for a manufacturing system. The intensity metric is determined based on a reflectivity of a location on a substrate and a ...