US Patent Issued to ASML Netherlands on Aug. 18 for "Apparatus for and method of reducing contamination from source material in an EUV light source" (Dutch, American Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,713,511, issued on Aug. 18, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Apparatus for and method of reducing contamination from source material in an EUV light source" was invented by Yue Ma (Escondido, Calif.), Dzmitry Labetski (Eindhoven, Netherlands) and Andrew David LaForge (Poway, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a source for and method of generating extreme ultraviolet radiation in which spitting of molten target material is hindered through depletion of the number of hydrogen radicals available to enter deposits of molten target material and create hydrogen bubbles therein by introducing an a...