US Patent Issued to ASML NETHERLANDS on Aug. 11 for "Detector substrate for use in a charged particle multi-beam assessment tool" (Dutch Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,706,272, issued on Aug. 11, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Detector substrate for use in a charged particle multi-beam assessment tool" was invented by Marco Jan-Jaco Wieland (Delft, Netherlands), Stoyan Nihtianov (Eindhoven, Netherlands), Roy Ramon Veenstra (Delft, Netherlands) and Hui Jiang (Utrecht, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A detector substrate (or detector array) for use in a charged particle multi-beam assessment tool to detect charged particles from a sample. The detector substrate defines an array of apertures for beam paths of respective charged particle beams of a multi-beam. T...