US Patent Issued to ASML Netherlands B. V. on May 12 for "Illumination source and associated metrology apparatus" (Dutch, Swedish Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,940, issued on May 12, was assigned to ASML Netherlands B. V. (Veldhoven, Netherlands).

"Illumination source and associated metrology apparatus" was invented by Wenjie Jin (Eindhoven, Netherlands), Petrus Wilhelmus Smorenburg (Veldhoven, Netherlands), Nan Lin (Eindhoven, Netherlands), Christina Lynn Porter (Veldhoven, Netherlands), David O'Dwyer (Eindhoven, Netherlands), Cord Louis Arnold (Rydeback, Sweden) and Sjoerd Nicolaas Lambertus Donders (Vught, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is an illumination source comprising a gas delivery system being configured to provide a gas target for generating an emitted radiat...