US Patent Issued to ASML Netherlands B. V. on April 21 for "Apparatus using enhanced deflectors to manipulate charged particle beams" (California Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,609,264, issued on April 21, was assigned to ASML Netherlands B. V. (Veldhoven, Netherlands).

"Apparatus using enhanced deflectors to manipulate charged particle beams" was invented by Yongxin Wang (San Ramon, Calif.), Zhonghua Dong (San Jose, Calif.), Xiaoyu Ji (San Jose, Calif.), Shahedul Hoque (Milpitas, Calif.), Weiming Ren (San Jose, Calif.), Xuedong Liu (San Jose, Calif.), Guofan Ye (South San Francisco, Calif.) and Kuo-Chin Chien (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus includes a first charged particle beam manipulator positioned in a first layer configured to influence a charged particle beam and a second c...