US Patent Issued to ASML NETHERLANDS, ASML HOLDING on March 24 for "Lithographic apparatus, multi-wavelength phase-modulated scanning metrology system and method" (Dutch, American Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,585,198, issued on March 24, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands) and ASML HOLDING N.V. (Veldhoven, Netherlands).

"Lithographic apparatus, multi-wavelength phase-modulated scanning metrology system and method" was invented by Sebastianus Adrianus Goorden (Eindhoven, Netherlands), Filippo Alpeggiani (Eindhoven, Netherlands), Simon Reinald Huisman (Eindhoven, Netherlands), Johannes Jacobus Matheus Baselmans (Oirschot, Netherlands), Haico Victor Kok (Veldhoven, Netherlands), Mohamed Swillam (Wilton, Conn.) and Arjan Johannes Anton Beukman (Son en Breugel, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A metrology syst...