US Patent Issued to ASML Holding on May 19 for "Metrology systems with phased arrays for contaminant detection and microscopy" (Connecticut Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,631,975, issued on May 19, was assigned to ASML Holding N.V. (Veldhoven, Netherlands).

"Metrology systems with phased arrays for contaminant detection and microscopy" was invented by Mohamed Swillam (Wilton, Conn.), Wei Guo (Wilton, Conn.) and Stephen Roux (New Fairfield, Conn.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A metrology system includes a radiation source (708), a phased array (722a,b;724a,b;726;734), a detector, and a comparator. The phased array includes optical elements (706), waveguides (704), and phase modulators (702). The phased array generates a beam of radiation and directs the beam toward a surface of an object. The optical eleme...