US Patent Issued to ASML HOLDING, ASML NETHERLANDS on March 24 for "Metrology mark structure and method of determining metrology mark structure" (American, Dutch Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,585,201, issued on March 24, was assigned to ASML HOLDING N.V. (Veldhoven, Netherlands) and ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Metrology mark structure and method of determining metrology mark structure" was invented by Tamer Mohamed Tawfik Ahmed Mohamed Elazhary (New Canaan, Conn.), Robert John Socha (Campbell, Calif.), Stephen Roux (New Fairfield, Conn.) and Simon Reinald Huisman (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A structure of a semiconductor device with a sub-segmented grating structure as a metrology mark and a method for configuring the metrology mark. The method for configuring a metrology mark ...