ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,751,229, issued on Sept. 29, was assigned to ASM IP Holding B.V. (Almere, Netherlands).
"Methods and systems for topography-selective depositions" was invented by Timothee Blanquart (Oud-Heverlee, Belgium), Rene Henricus Jozef Vervuurt (Leuven, Belgium) and Shaoren Deng (Ghent, Belgium).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are methods and related systems for topography-selective depositions. Embodiments of presently described methods comprise employing a sacrificial gap filling fluid for selectively forming a material on a distal surface of a gap, and not on at least one of sidewalls of the gap and proximal surfaces. Further describe...