ALEXANDRIA, Va., Oct. 6 -- United States Patent no. D1,151,519, issued on Oct. 6, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Semiconductor deposition reactor support" was invented by Rutvij Naik (Tempe, Ariz.), Junwei Su (Chandler, Ariz.), Wentao Wang (Chandler, Ariz.), Chuqin Zhou (Tempe, Ariz.) and Xing Lin (Chandler, Ariz.).

The patent was filed on March 25, 2024, under Application No. D/934,264.

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