US Patent Issued to ASM IP Holding on Oct. 27 for "Method for selectively removing oxide from a surface" (American, Finnish Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,774,432, issued on Oct. 27, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Method for selectively removing oxide from a surface" was invented by Charles Dezelah (Helsinki), Fei Wang (Phoenix), Robin Scott (Phoenix), Woo Jung Shin (Chandler, Ariz.) and Amin Azimi (Phoenix).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of cleaning (e.g., selectively removing an oxide from) a surface of a substrate is disclosed. An exemplary method includes providing one or more of a haloalkylamine and a halogenated sulfur compound to a reaction chamber to selectively remove the silicon oxide from the surface."

The patent was filed on Nov. 21, 2022, ...