ALEXANDRIA, Va., Oct. 21 -- United States Patent no. D1,154,542, issued on Oct. 20, was assigned to ASM IP Holding B.V. (Almere, Netherlands).
"Susceptor for a crossflow chemical vapor deposition reactor" was invented by Qichao Hu (Tempe, Ariz.), Ion Hong Chao (Gilbert, Ariz.), Fan Gao (Chandler, Ariz.), Han Ye (Phoenix), Junwei Su (Chandler, Ariz.) and Wentao Wang (Chandler, Ariz.).
The patent was filed on April 29, 2025, under Application No. D/001,588.
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