ALEXANDRIA, Va., May 19 -- United States Patent no. 12,630,919, issued on May 19, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Compositions for depositing material, synthesis methods and uses" was invented by Charles Dezelah (Helsinki), Craig Wheaton (Kingston, Canada) and Qi Xie (Wilsele, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "The current disclosure relates to a composition for depositing group 13 metal-containing material on a substrate. The composition comprises a metal alkyl precursor, wherein the metal alkyl precursor comprises a group 13 metal atom and two different alkyl ligand types. The first ligand type is a branched C4 to C8 alkyl bonded to the group 13 metal atom th...