US Patent Issued to ASM IP Holding on May 12 for "Methods for forming and utilizing antimony containing films, and related structures" (Belgian, British, Japanese, Finnish Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,450, issued on May 12, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Methods for forming and utilizing antimony containing films, and related structures" was invented by Paul Chatelain (Tokyo), Arpita Saha (Cardiff, Great Britain), David Kurt de Roest (Leuven, Belgium), Yoann Tomczak (Leuven, Belgium), Charles Dezelah (Helsinki) and Daniele Piumi (Etterbeek, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods for forming an antimony containing film on a substrate. Related structures and films are also disclosed. The antimony films are be formed by a plasma enhanced atomic layer deposition process. The antimony fil...