US Patent Issued to ASM IP Holding on March 31 for "Cyclical deposition methods" (South Korean, Japanese Inventors)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,590,364, issued on March 31, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Cyclical deposition methods" was invented by Trigagema Gama (Hwaseong-si, South Korea) and Ryu Nakano (Sagamihara, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods for depositing a layer comprising silicon oxide on the substrate are disclosed. Exemplary methods include cyclical deposition methods that include providing a first silicon precursor to the reaction chamber, providing a second silicon precursor, and using a reactant or a non-reactant gas forming silicon oxide on a surface of the substrate. Exemplary methods can further include a treatment ste...